Chemical Vapor Deposition (journal)

Chemical Vapor Deposition  
Abbreviated title (ISO 4)
'Chem. Vap. Deposition'
Discipline Materials science
Language English
Edited by Peter Gregory
Publication details
Publisher
Publication history
1995-present
Frequency Monthly
1.804
Indexing
ISSN 0948-1907 (print)
1521-3862 (web)
Links

Chemical Vapor Deposition is a monthly peer-reviewed scientific journal covering materials science. It publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. Frequent topics covered by the journal also include inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

References

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