OASIS.MASK

This is an OASIS.MASK expression of a portion of a top cell view of a single layer within an integrated circuit. A top cell view expressed in the OASIS.MASK language represents all figures from all cells within the OASIS.MASK file. An OASIS.MASK representation can contain only one layer and one top cell. Contrasting OASIS.MASK with OASIS, a single OASIS representation can have many layers and many top cells.

OASIS.MASK^[1] is a standardized language used by computers to represent and express the electronic pattern of an integrated circuit during the engineering, pattern generation and the inspection of semiconductor photomasks.

SEMI P44 OASIS.MASK (OASIS.MASK) is a constrained version of SEMI P39 OASIS (OASIS). This constrained version of OASIS emphasizes the data constructs, values and record types that streamline the OASIS reading and writing processes that are unique to the computer systems used in the semiconductor integrated circuit photomask manufacturing flow. The use of OASIS.MASK within the photomask manufacturing flow is optional. OASIS can be used as well.

All allowed OASIS record types have been categorized in OASIS.MASK as either Mandatory(M), Allowed(A), Ignored(I), Prohibited(X). Furthermore, the values assigned to each record type must be within a range of values established by the OASIS.MASK standard. OASIS.MASK specifies user-defined PROPERTY records that are not supported in OASIS as "standard" PROPERTY record types.

OASIS Record Type Restrictions in OASIS.MASK

An OASIS.MASK file can contain only one layer, one top cell and three levels of hierarchy. An OASIS file can have more than one layer, more than one top cell and can have more than three levels of hierarchy. An OASIS.MASK file can contain only the OASIS figure record types RECTANGLE, TRAPEZOID and CTRAPEZOID. OASIS.MASK prohibits the use of the other OASIS figure record types POLYGON, PATH and CIRCLE. OASIS.MASK defines minimum and maximum allowed values for each allowed record. In OASIS, there are no maximum and minimum restrictions. For instance, all OASIS.MASK name-string lengths cannot be greater than 256 characters. In OASIS, there is no limit to the length of a name-string.

Example OASIS.MASK textual representation of a single layer within a top cell

The example below shows all Mandatory(M) record types that start an OASIS.MASK file. We created a cell that contains a 1000000,1000000 (w,h) RECTANGLE record and then placed that cell within the cell "Top". The cell "Top" has been defined as the top cell.

The size of the rectangle in cell "R1" defines the maximum size (1,1 (w,h) mm) of any cell within an OASIS.MASK file other than the top cell which can be (2³²-1, 2³²-1 (w,h)) grid units. For the rectangle in cell "R1", there are 1000000 w,h grid units per millimeter(mm).

User-defined properties unique to OASIS.MASK, and whose propname-strings are defined in the PROPNAME(8) records below, start with P44.

- MAGIC "%SEMI-OASIS\015\012"
1 START version="1.0" unit=real0(1000) offsetFlag=1
28 PROPERTY 00010CNS refNum=1 count=(1) integer8(2)
28 PROPERTY 00010CN0 refNum=4 count=(1) string10("1")
28 PROPERTY 01000CN0 refNum=5 count=(4) integer9(-500000) integer9(-500000) integer9(500000) integer9(500000)
28 PROPERTY 00010CN0 refNum=6 count=(1) string10("2.0")
28 PROPERTY 00010CN0 refNum=7 count=(1) integer8(706)
28 PROPERTY 00010CN0 refNum=8 count=(1) integer8(1)
28 PROPERTY 00110CN0 refNum=10 count=(3) string10("20-01-2011") string10("23:59:59") real0(9)
28 PROPERTY 00100CN0 refNum=11 count=(2) integer8(1000000) integer8(1000000)
28 PROPERTY 00010CN0 refNum=13 count=(1) integer8(0)
13 CELL refNum=0
20 RECTANGLE 0WHXY0DL layer=21 datatype=0 width=1000000 height=1000000 x=0 y=0
13 CELL refNum=1
17 PLACEMENT CNXY0AA0 refNum=0 angle=real0(0) x=0 y=0
8 PROPNAME name="S_BOUNDING_BOXES_AVAILABLE" refNum=1
8 PROPNAME name="S_BOUNDING_BOX" refNum=2
8 PROPNAME name="S_CELL_OFFSET" refNum=3
8 PROPNAME name="P44_FORMAT" refNum=4
8 PROPNAME name="P44_CHIP_WINDOW" refNum=5
8 PROPNAME name="P44_VERSION" refNum=6
8 PROPNAME name="P44_FILE_SIZE" refNum=7
8 PROPNAME name="P44_TOP_CELL_NUMBER" refNum=8
8 PROPNAME name="P44_CONVERSION_DATE" refNum=10
8 PROPNAME name="P44_BOUNDING_BOX_MAX" refNum=11
8 PROPNAME name="P44_GEOMETRY_OFFSET_AVAILABLE" refNum=13
8 PROPNAME name="P44_GEOMETRY_COUNT" refNum=14
3 CELLNAME name="R1" refNum=(0)
28 PROPERTY 01010CNS refNum=2 count=(5) integer8(0) integer9(-500000) integer9(-500000) integer8(1000000) integer8(1000000)
28 PROPERTY 00010CNS refNum=3 count=(1) integer8(114)
28 PROPERTY 00010CN0 refNum=14 count=(1) integer8(1)
3 CELLNAME name="Top" refNum=(1)
28 PROPERTY 00010CN0 refNum=14 count=(1) integer8(0)
28 PROPERTY 01010CNS refNum=2 count=(5) integer8(0) integer9(-500000) integer9(-500000) integer8(1000000) integer8(1000000)
28 PROPERTY 00010CNS refNum=3 count=(1) integer8(128)
2 END offsets=[(1,378) (1,0) (1,135) (1,0) (1,0) (1,0)]

Industry Standard

OASIS.MASK and OASIS are formalized industry standards. Both are owned and maintained by the trade and standards organization SEMI. SEMI serves the semiconductor materials and equipment industries worldwide.

The fee-based specifications for SEMI P39 OASIS and SEMI P44 OASIS.MASK can be downloaded from SEMI's web-site.

References

• Deployment of OASIS in the Semiconductor Industry – Status, Dependencies and Outlook
• Dawn at the OASIS, Dusk for GDSII
• Deployment of OASIS In The Semiconductor Industry
• Deployment of OASIS.MASK (P44) as Direct Input for Mask Inspection of Advanced Photomasks
• Efficient OASIS.MASK reader
• Evaluation of mask data format standard OASIS.MASK developed for mask tools
• SEMI P44 OASIS^TM Standard
• SEMI P39 OASIS^TM Standard

Footnotes

1. The trade name OASIS is a registered trademark in the USA of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by SEMI.