Radiation hardening

Not to be confused with hard radiation.

Radiation hardening is the act of making electronic components and systems resistant to damage or malfunctions caused by ionizing radiation (particle radiation and high-energy electromagnetic radiation),^[1] such as those encountered in outer space and high-altitude flight, around nuclear reactors and particle accelerators, or during nuclear accidents or nuclear warfare.

Most semiconductor electronic components are susceptible to radiation damage; radiation-hardened components are based on their non-hardened equivalents, with some design and manufacturing variations that reduce the susceptibility to radiation damage. Due to the extensive development and testing required to produce a radiation-tolerant design of a microelectronic chip, radiation-hardened chips tend to lag behind the most recent developments.

Radiation-hardened products are typically tested to one or more resultant effects tests, including total ionizing dose (TID), enhanced low dose rate effects (ELDRS), neutron and proton displacement damage, and single event effects (SEE, SET, SEL and SEB).

Problems caused by radiation

Major radiation damage sources

Typical sources of exposure of electronics to ionizing radiation are the Van Allen radiation belts for satellites, nuclear reactors in power plants for sensors and control circuits, particle accelerators for control electronics particularly particle detector devices, residual radiation from isotopes in chip packaging materials, cosmic radiation for spacecraft and high-altitude aircraft, and nuclear explosions for potentially all military and civilian electronics.

Cosmic rays come from all directions and consist of approximately 85% protons, 14% alpha particles, and 1% heavy ions, together with x-ray and gamma-ray radiation. Most effects are caused by particles with energies between 10⁸ and 2*10¹⁰ eV. The atmosphere filters most of these, so they are primarily a concern for spacecraft and high-altitude aircraft.
Solar particle events come from the direction of the sun and consist of a large flux of high-energy (several GeV) protons and heavy ions, again accompanied by x-ray radiation.
Van Allen radiation belts contain electrons (up to about 10 MeV) and protons (up to 100s MeV) trapped in the geomagnetic field. The particle flux in the regions farther from the Earth can vary wildly depending on the actual conditions of the Sun and the magnetosphere. Due to their position they pose a concern for satellites.
Secondary particles result from interaction of other kinds of radiation with structures around the electronic devices.
Nuclear reactors produce gamma radiation and neutron radiation which can affect sensor and control circuits in nuclear power plants.
Particle accelerators produce high energy protons and electrons, and the secondary particles produced by their interactions product significant radiation damage on sensitive control and particle detector components, of the order of magnitude of 10 MRad[Si]/year for systems such as the Large Hadron Collider.
Nuclear explosions produce a short and extremely intense surge through a wide spectrum of electromagnetic radiation, an electromagnetic pulse (EMP), neutron radiation, and a flux of both primary and secondary charged particles. In case of a nuclear war they pose a potential concern for all civilian and military electronics.
Chip packaging materials were an insidious source of radiation that was found to be causing soft errors in new DRAM chips in the 1970s. Traces of radioactive elements in the packaging of the chips were producing alpha particles, which were then occasionally discharging some of the capacitors used to store the DRAM data bits. These effects have been reduced today by using purer packaging materials, and employing error-correcting codes to detect and often correct DRAM errors.

Radiation effects on electronics

Fundamental mechanisms

Two fundamental damage mechanisms take place:

Lattice displacement, caused by neutrons, protons, alpha particles, heavy ions, and very high energy gamma photons. They change the arrangement of the atoms in the crystal lattice, creating lasting damage, and increasing the number of recombination centers, depleting the minority carriers and worsening the analog properties of the affected semiconductor junctions. Counterintuitively, higher doses over short time cause partial annealing ("healing") of the damaged lattice, leading to a lower degree of damage than with the same doses delivered in low intensity over a long time. This type of problem is particularly significant in bipolar transistors, which are dependent on minority carriers in their base regions; increased losses caused by recombination cause loss of the transistor gain (see neutron effects).
Ionization effects are caused by charged particles, including the ones with energy too low to cause lattice effects. The ionization effects are usually transient, creating glitches and soft errors, but can lead to destruction of the device if they trigger other damage mechanisms (e.g. a latchup). Photocurrent caused by ultraviolet and x-ray radiation may belong to this category as well. Gradual accumulation of holes in the oxide layer in MOSFET transistors leads to worsening of their performance, up to device failure when the dose is high enough (see total ionizing dose effects).

The effects can vary wildly depending on all the parameters - type of radiation, total dose and radiation flux, combination of types of radiation, and even the kind of device load (operating frequency, operating voltage, actual state of the transistor during the instant it is struck by the particle), which makes thorough testing difficult, time consuming, and requiring a lot of test samples.

Resultant effects

The "end-user" effects can be characterized in several groups:

Neutron effects: A neutron interacting with the semiconductor lattice will displace its atoms. This leads to an increase in the count of recombination centers and deep-level defects, reducing the lifetime of minority carriers, thus affecting bipolar devices more than CMOS ones. Bipolar devices on silicon tend to show changes in electrical parameters at levels of 10¹⁰ to 10¹¹ neutrons/cm², CMOS devices aren't affected until 10¹⁵ neutrons/cm². The sensitivity of the devices may increase together with increasing level of integration and decreasing size of individual structures. There is also a risk of induced radioactivity caused by neutron activation, which is a major source of noise in high energy astrophysics instruments. Induced radiation, together with residual radiation from impurities in used materials, can cause all sorts of single-event problems during the device's lifetime. GaAs LEDs, common in optocouplers, are very sensitive to neutrons. The lattice damage influences the frequency of crystal oscillators. Kinetic energy effects (namely lattice displacement) of charged particles belong here too.
Total ionizing dose effects: The cumulative damage of the semiconductor lattice (lattice displacement damage) caused by ionizing radiation over the exposition time. It is measured in rads and causes slow gradual degradation of the device's performance. A total dose greater than 5000 rads delivered to silicon-based devices in seconds to minutes will cause long-term degradation. In CMOS devices, the radiation creates electron–hole pairs in the gate insulation layers, which cause photocurrents during their recombination, and the holes trapped in the lattice defects in the insulator create a persistent gate biasing and influence the transistors' threshold voltage, making the N-type MOSFET transistors easier and the P-type ones more difficult to switch on. The accumulated charge can be high enough to keep the transistors permanently open (or closed), leading to device failure. Some self-healing takes place over time, but this effect is not too significant. This effect is the same as hot carrier degradation in high-integration high-speed electronics. Crystal oscillators are somewhat sensitive to radiation doses, which alter their frequency. The sensitivity can be greatly reduced by using swept quartz. Natural quartz crystals are especially sensitive. Radiation performance curves for TID testing may be generated for all resultant effects testing procedures. These curves show performance trends throughout the TID test process and are included in the radiation test report.
Transient dose effects: The short-time high-intensity pulse of radiation, typically occurring during a nuclear explosion. The high radiation flux creates photocurrents in the entire body of the semiconductor, causing transistors to randomly open, changing logical states of flip-flops and memory cells. Permanent damage may occur if the duration of the pulse is too long, or if the pulse causes junction damage or a latchup. Latchups are commonly caused by the x-rays and gamma radiation flash of a nuclear explosion. Crystal oscillators may stop oscillating for the duration of the flash due to prompt photoconductivity induced in quartz.
Systems-generated EMP effects (SGEMP) are caused by the radiation flash traveling through the equipment and causing local ionization and electric currents in the material of the chips, circuit boards, cables and cases.
Single-event effects (SEE) are phenomena affecting mostly digital devices (see the following section for an overview of the various types of SEE).

Digital damage: SEE

Single-event effects (SEE), mostly affecting only digital devices, were not studied extensively until relatively recently. When a high-energy particle travels through a semiconductor, it leaves an ionized track behind. This ionization may cause a highly localized effect similar to the transient dose one - a benign glitch in output, a less benign bit flip in memory or a register or, especially in high-power transistors, a destructive latchup and burnout. Single event effects have importance for electronics in satellites, aircraft, and other civilian and military aerospace applications. Sometimes, in circuits not involving latches, it is helpful to introduce RC time constant circuits that slow down the circuit's reaction time beyond the duration of an SEE.

Single-event upsets (SEU) or transient radiation effects in electronics are state changes of memory or register bits caused by a single ion interacting with the chip. They do not cause lasting damage to the device, but may cause lasting problems to a system which cannot recover from such an error. In very sensitive devices, a single ion can cause a multiple-bit upset (MBU) in several adjacent memory cells. SEUs can become Single-event functional interrupts (SEFI) when they upset control circuits, such as state machines, placing the device into an undefined state, a test mode, or a halt, which would then need a reset or a power cycle to recover.
Single-event latchup (SEL) can occur in any chip with a parasitic PNPN structure. A heavy ion or a high-energy proton passing through one of the two inner-transistor junctions can turn on the thyristor-like structure, which then stays "shorted" (an effect known as latchup) until the device is power-cycled. As the effect can happen between the power source and substrate, destructively high current can be involved and the part may fail. Bulk CMOS devices are most susceptible.
Single-event transient (SET) happens when the charge collected from an ionization event discharges in the form of a spurious signal traveling through the circuit. This is de facto the effect of an electrostatic discharge.
Single-event snapback, similar to SEL but not requiring the PNPN structure, can be induced in N-channel MOS transistors switching large currents, when an ion hits near the drain junction and causes avalanche multiplication of the charge carriers. The transistor then opens and stays opened.
Single-event induced burnout (SEB) may occur in power MOSFETs when the substrate right under the source region gets forward-biased and the drain-source voltage is higher than the breakdown voltage of the parasitic structures. The resulting high current and local overheating then may destroy the device.
Single-event gate rupture (SEGR) was observed in power MOSFETs when a heavy ion hits the gate region while a high voltage is applied to the gate. A local breakdown then happens in the insulating layer of silicon dioxide, causing local overheat and destruction (looking like a microscopic explosion) of the gate region. It can occur even in EEPROM cells during write or erase, when the cells are subjected to a comparatively high voltage.

SEE testing

While proton beams are widely used for SEE testing due to availability, at lower energies proton irradiation can often underestimate SEE susceptibility. Furthermore, proton beams expose devices to risk of total ionizing dose (TID) failure which can cloud proton testing results or result in pre-mature device failure. White neutron beams — ostensibly the most representative SEE test method — are usually derived from solid target-based sources, resulting in flux non-uniformity and small beam areas. White neutron beams also have some measure of uncertainty in their energy spectrum, often with high thermal neutron content.

The disadvantages of both proton and spallation neutron sources can be avoided by using mono-energetic 14 MeV neutrons for SEE testing. A potential concern is that mono-energetic neutron-induced single event effects will not accurately represent the real-world effects of broad-spectrum atmospheric neutrons. However, recent studies have indicated that, to the contrary, mono-energetic neutrons—particularly 14 MeV neutrons—can be used to quite accurately understand SEE cross-sections in modern microelectronics.

A particular study of interest, performed in 2010 by Normand and Dominik,^[2] powerfully demonstrates the effectiveness of 14 MeV neutrons.

The first devoted SEE testing laboratory in Canada is currently being established in Southern Ontario under the name RE-Labs Inc..